Optical Recorder of Nanostructures and Microstructures for Quantum Technologies

CzechrepublicTenders notice for Optical Recorder of Nanostructures and Microstructures for Quantum Technologies. The reference ID of the tender is 78562023 and it is closing on 10 Mar 2023.

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Tender Details

  • Country: Czech Republic
  • Summary: Optical Recorder of Nanostructures and Microstructures for Quantum Technologies
  • CZT Ref No: 78562023
  • Deadline: 10 Mar 2023
  • Competition: ICB
  • Financier: Self Financed
  • Purchaser Ownership: Public
  • Tender Value: Refer Document
  • Notice Type: Tender
  • Document Ref. No.: F2023-006264
  • Purchaser's Detail :
  • Purchaser : CZECH TECHNICAL UNIVERSITY IN PRAGUE
    Břehova 7, 115 19 Prague1
    Mgr. Zuzana Hradil Gawlova, lawyer
    Email :posta@uohs.cz

  • Description :
  • (nature and amount of work, supplies or services or indication of relevant needs and requirements) The subject of the contract is the supply of a compact optical lithographic system with simple operation, which enables direct writing into the photoresist at high speed without the use of a mask. The system must enableand recording both on large surfaces with variable resolution and on multiple sub-millimeter wafers at the same time in high resolution, as well as multiple recording with precise alignment and the possibility of a virtual preview before exposure. 385 nm light source (with a possible deviation of +/-5 nm), which is suitable for both positive and negativeit, broadband, g-, h-, i-line and also usable for SU-8 photoresists. The system must enable long-term high-resolution exposures with effective suppression of vibrations and temperature fluctuations. The system must include a control unit, software for controlling the lithography and real-time imaging.
    Subject to pThe contract is the supply of a compact optical lithography system with simple operation, which enables direct writing into the photoresist at high speed without the use of a mask. The system must enable writing both on large surfaces with variable resolution and on multiple sub-millimeter wafers simultaneously in higheye resolution, as well as multiple recording with precise alignment and the possibility of a virtual preview before exposure. A 385 nm light source (with a possible deviation of +/-5 nm), which is suitable for positive and negative, broadband, g-, h-, i-line and also usable for SU-8 photoresists. The system must allow long-lastingexposure in high resolution with effective suppression of vibrations and temperature fluctuations. The system must include a control unit, lithography control software, and real-time imaging.
  • Documents :
  •  Tender Notice

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